Taking Hydrogen Resist Lithography to the Third Dimension

Speaker: 
Dr Matthias Koch
From: 
CQC2T UNSW
When: 
4pm Thursday 21 April 2016
Where: 
CQC2T conference Room, Level 2 Newton Building UNSW

Hydrogen-resist lithography on Si(100) has become a reliable tool to fabricate nano-scale circuits. Traditionally, our devices were constricted to a single 2D plane. Our technique can be adapted to the fabrication in 3D as well. In this talk I will discuss the requirements on alignment and surface quality. Finally, I will present results of two working 3D single electron transistors, one with a top gate and one with an additional single donor tuned by the top gate.